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US Patent Issued to Tokyo Electron on Aug. 11 for "Substrate treatment method, storage medium, and substrate treatment apparatus" (Japanese Inventor)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,779, issued on Aug. 11, was assigned to Tokyo Electron Ltd. (Tokyo). "Substrate treatment method, storage medium, and substrate treatment a... Read More


US Patent Issued to SHIN-ETSU CHEMICAL on Aug. 11 for "Resist material and patterning process" (Japanese Inventor)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,780, issued on Aug. 11, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo). "Resist material and patterning process" was invented by Jun H... Read More


US Patent Issued to Sumitomo Chemical on Aug. 11 for "Salt, acid generator, resist composition and method for producing resist pattern" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,781, issued on Aug. 11, was assigned to Sumitomo Chemical Co. Ltd. (Tokyo). "Salt, acid generator, resist composition and method for produc... Read More


US Patent Issued to FUJIFILM on Aug. 11 for "Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and compound" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,782, issued on Aug. 11, was assigned to FUJIFILM Corp. (Tokyo). "Actinic ray-sensitive or radiation-sensitive resin composition, actinic ra... Read More


US Patent Issued to DUK SAN NEOLUX on Aug. 11 for "Method for preparing pixel define layer" (South Korean Inventors)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,783, issued on Aug. 11, was assigned to DUK SAN NEOLUX Co. LTD. (Cheonan-si, South Korea). "Method for preparing pixel define layer" was in... Read More


US Patent Issued to Hyun Min Kim on Aug. 11 for "Substrate processing apparatus and substrate processing method" (South Korean Inventors)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,784, issued on Aug. 11, was assigned to Hyun Min Kim (Cheonan-si, South Korea). "Substrate processing apparatus and substrate processing me... Read More


US Patent Issued to Tokyo Electron on Aug. 11 for "Point of use solvent mixing for film removal" (New York Inventors)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,785, issued on Aug. 11, was assigned to Tokyo Electron Ltd. (Tokyo). "Point of use solvent mixing for film removal" was invented by Lior Hu... Read More


US Patent Issued to XEIKON PREPRESS on Aug. 11 for "Apparatus and method for treating and transporting a relief printing plate precursor" (Belgian Inventor)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,786, issued on Aug. 11, was assigned to XEIKON PREPRESS N.V. (Ypres, Belgium). "Apparatus and method for treating and transporting a relief... Read More


US Patent Issued to KLA on Aug. 11 for "Single-cell scatterometry overlay with sensitivity calibration" (Israeli Inventor)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,787, issued on Aug. 11, was assigned to KLA Corp. (Milpitas, Calif.). "Single-cell scatterometry overlay with sensitivity calibration" was ... Read More


US Patent Issued to KLA on Aug. 11 for "Parallax method for a single-cell diffraction based measurement of misregistration" (Israeli Inventors)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,788, issued on Aug. 11, was assigned to KLA Corp. (Milpitas, Calif.). "Parallax method for a single-cell diffraction based measurement of m... Read More